Lithographic system, sensor, and method of measuring properties of a substrate
AssigneeASML Netherlands B.V.
InventorsArie Den Boef, Wilhelmus Corbeij, Mircea Dusa, Reinder Plug
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Abstract
A sensor measuring properties of a substrate in which radiation is projected onto the substrate by a radiation projector that has a first part configured such that the radiation projection can project onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector can project onto the substrate linearly polarized radiation oriented in a second direction orthogonal to the first direction.
Claims17
A sensor system for measuring properties of a substrate, comprising:
- a radiation projector configured to project radiation onto the substrate;
- and
- a detector configured to detect the radiation reflected from the substrate, wherein the radiation projector has a first part configured such that the radiation projector projects onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector projects onto the substrate linearly polarized radiation oriented in a second direction, orthogonal to the first direction.
A lithographic system arranged to transfer a pattern from a patterning device onto a substrate, the lithographic system comprising a sensor for measuring properties of the substrate, the sensor comprising a radiation projector configured to project radiation onto the substrate;
- and a detector configured to detect the radiation reflected from the substrate, wherein the radiation projector has a first part configured such that the radiation projector projects onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector projects onto the substrate linearly polarized radiation oriented in a second direction, orthogonal to the first direction.
A method of measuring properties of a substrate, comprising:
- projecting radiation onto a substrate using a radiation projector;
- and
- detecting radiation reflected from the substrate that is indicative of the properties to be measured, wherein the radiation projector is configured to project onto the substrate linearly polarized radiation oriented in a first direction and linearly polarized radiation oriented in a second direction, orthogonal to the first direction.
Dependencies are inferred from the claim text.