Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus

A lithographic projection apparatus comprising:

• an illumination system configured to condition a beam of radiation;
• a support structure configured to hold a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
• a substrate table configured to hold a substrate;
• and
• a projection system configured to project the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate and to project a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate;
• and
• a controller configured to control formation of a cross-section of the beam to be projected onto the substrate edge target portion, the cross-section having an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate, a part of the cross-section of the beam is to be incident on the substrate, and another part of the cross-section of the beam is not to be incident on the substrate.