Exposure device
OwnerOsamu Kasono, Osamu Kumasaka +1inventors
InventorsOsamu Kasono, Osamu Kumasaka, Yasuo Hosoda
Life of this patent
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Abstract
The device includes a substrate holding portion for holding a substrate having resist formed thereon, a driving portion for varying the irradiation position of an exposure beam relatively to the substrate, and a cooling portion for cooling the substrate during irradiation of the exposure beam.
Claims16
1-6. (canceled)
An exposure device for irradiating an exposure beam to a substrate having a resist formed thereon, comprising:
- a substrate mount portion for holding the substrate;
- a spindle for rotating the substrate mount portion;
- a fluid bearing portion for holding the spindle;
- and
- a conduit pipe for supplying cooling fluid through the fluid bearing portion and the spindle to the substrate mount portion.
(canceled)
An exposure device for irradiating an exposure beam to a disc-shaped substrate having a resist formed thereon to form a latent image on the resist, comprising:
- a substrate mount portion for holding the substrate and rotating the substrate;
- an irradiating portion for irradiating the exposure beam to the substrate;
- and
- a low temperature member that is disposed at the exposure surface side of the substrate and at the rotational downstream side of the irradiation position of the exposure beam.
An exposure device for irradiating an exposure beam to a substrate having a resist formed thereon, comprising:
- a substrate holding portion for holding the substrate;
- a driving portion for varying the irradiation position of the exposure beam relatively to the substrate;
- and
- an air blower for feeding air to the irradiation position of the exposure beam during irradiation of the exposure beam to cool the irradiation position.
An exposure device for irradiating an exposure beam to a substrate having a resist formed thereon to form a latent image formed on the resist comprising:
- a substrate holding portion for holding the substrate;
- a driving portion for rotating and translating the substrate to vary the irradiation position of the exposure beam relatively to the substrate;
- a cooling portion for cooling the substrate during irradiation of the exposure beam;
- an irradiation position detector for detecting the irradiation position of the exposure beam;
- a plurality of temperature detectors arranged along the radial direction of the substrate for detecting the temperatures of the substrate;
- and
- a temperature controller for controlling the temperature of the irradiation position on the basis of the temperature detected by the plurality of temperature detectors.
Dependencies are inferred from the claim text.