System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

A dispenser cathode which comprises:

• an emission surface comprising at least one emission area for emitting electrons and at least one non-emission area covered with emission-suppressing material and surrounding each emission area;
• a reservoir for material releasing, when heated, work-function-lowering particles;
• at least one passage connecting said reservoir and said emission surface for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said at least one passage debouching in said non-emission area and within a diffusion length distance from the emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area via the non-emission area surrounding said emission area.

A semiconductor wafer, processed using a lithography system according to claim