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US 2007/0182279 A1Published application
Surface acoustic wave device and electronic apparatus
AssigneeSeiko Epson Corporation
InventorsShuichi Kawano, Satoshi Fujii
Life of this patent
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Abstract
A surface acoustic wave device includes: (a) a substrate; (b) a piezoelectric film formed on top of the substrate; (c) an electrode for generating a surface acoustic wave formed on top of the piezoelectric film; (d) a first covering film formed on the electrode to cover the electrode, and made of the same material as that of the piezoelectric film; and (e) a second covering film formed on the first covering film.
Claims12
A surface acoustic wave device comprising:
- (a) a substrate;
- (b) a piezoelectric film formed on top of the substrate;
- (c) an electrode for generating a surface acoustic wave formed on top of the piezoelectric film;
- (d) a first covering film formed on the electrode to cover the electrode, and made of the same material as that of the piezoelectric film;
- and
- (e) a second covering film formed on the first covering film.
3 more elements
A surface acoustic wave device comprising:
- (a) a substrate with a hard layer;
- (b) a piezoelectric film formed on the hard layer;
- (c) an electrode for generating a surface acoustic wave formed on top of the piezoelectric film;
- (d) a first covering film formed on the electrode to cover the electrode, and having a thermal conductivity greater than that of amorphous SiO2;
- and
- (e) a second covering film formed on the first covering film.
3 more elements
Dependencies are inferred from the claim text.