Semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorsOsamu WADA, Hiroaki Nakano, Hiroshi Ito, Toshimasa Namekawa, Atsushi Nakayama
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AssigneeKabushiki Kaisha Toshiba
InventorsOsamu WADA, Hiroaki Nakano, Hiroshi Ito, Toshimasa Namekawa, Atsushi Nakayama
Estimating the term…
A semiconductor device has a MOS capacitor in which a drain region and a source region of a MOS structure are commonly connected, and a capacitance is formed between the commonly connected drain region/source region and a gate electrode of the MOS structure; and a wiring capacitor which has a first comb-shaped wiring that is formed on said MOS capacitor through an interlayer insulating film, is connected to the gate electrode of said MOS capacitor, and has projecting portions projecting like comb teeth and a second comb-shaped wiring that is formed on said MOS capacitor through the interlayer insulating film, is arranged across an inter-line insulating film from the first comb-shaped wiring, is connected to the drain region and source region, and has projecting portions projecting like comb teeth, wherein the projecting portions of the second comb-shaped wiring are arranged alternately with the projecting portions of the first comb-shaped wiring and arranged perpendicularly to a channel direction connecting the drain region and source region of said MOS capacitor.
A semiconductor device comprising:
A charge pump circuit comprising:
Dependencies are inferred from the claim text.