Electron-beam exposure system

An electron-beam exposure system comprising:

• an electron gun for emitting a beam of electrons;
• a first mask including a first opening for shaping the beam of electrons;
• a second mask including a second opening for shaping the beam of electrons;
• a first deflector, disposed between the first mask and the second mask, for deflecting the beam of electrons;
• a stencil mask disposed below the first mask and the second mask, the stencil mask including a plurality of collective figured openings each for shaping the beam of electrons;
• a round aperture disposed between the stencil mask and a workpiece;
• a second deflector, disposed between the second mask and the stencil mask, for deflecting the beam of electrons;
• a paralleling lens, disposed between the stencil mask and the round aperture, for causing the beam of electrons, which has been transmitted in, and come out of, one of the collective figured openings, to turn into a beam of electrons which travels approximately in parallel to the optical axis;
• a swing-back mask deflector, disposed between the stencil mask and the round aperture, for swinging back the beam of electrons to the optical axis;
• and
• a projection lens, disposed between the round aperture and the workpiece, for focusing the beam of electrons on the surface of the workpiece to form an image thereon.