Charged particle optical apparatus with aberration corrector

A scanning charged particle optical microscope comprising an irradiation optical system for scanning the charged particle beam to a specimen, a specimen table for setting the relevant specimen, and a detecting optical system for detecting second charged particle generated from said specimen with irradiation of said charged particle beam,

• wherein said irradiation optical system includes a charged particle gun, an objective lens, and an aberration corrector arranged between said charged particle gun and said objective lens,
• said aberration corrector includes a first electromagnetic type mulitpole lens, a first complex type multipole lens arranged at the lower side of said first electromagnetic type multipole lens, a second complex type multipole lens arranged at the lower side of said first complex type multipole lens, and a second electromagnetic type multipole lens arranged at the lower side of said second complex type multipole lens,
• said first and second electromagnetic type multipole lenses and said first and second complex type multipole lenses include a plurality of poles arranged in the form of a ring, first coils provided to a plurality of said poles, and a first current input terminal for supplying a common current to said first coils provided to a plurality of said poles, and
• said complex type multipole lens further includes a voltage input terminal, conductive wires for distributing the voltage impressed to said voltage input terminal to a plurality of said poles, and moreover a first current source for supplying current to said first current input terminal and a voltage source for supplying voltage to said voltage input terminal.

A scanning charged particle optical apparatus comprising the functions for irradiating charged particle beam to a specimen on which a circuit pattern is formed, detecting secondary electron or backscattered electron generated by said irradiation of charged particle beam with a detector, and for conducting critical dimension or inspection of said circuit pattern using a detecting signal of said detector, comprising

• a scanning charged particle optical microscope including the function for detecting said charged particle beam irradiation, said second electron or said backscattered electron and an information processing means including the function to conduct critical dimension or inspection using said detecting signal, wherein
• said scanning charged particle optical microscope includes a charged particle gun, an objective lens, and an aberration corrector arranged between said charged particle gun and said objective lens,
• said aberration corrector includes a couple of electromagnetic type multipole lenses and a couple of complex type multipole lens arranged between a couple of said electromagnetic type multipole lenses,
• said electromagnetic multipole pole and said complex type multipole lens include a plurality of poles arranged in the form or a ring, first coils provided to a plurality of said poles, a first current input terminal for supplying a common current among first coils provided to a plurality of said poles, and
• said complex type multipole lens includes a voltage input terminal and conductive wires for distributing voltage impressed to said voltage input terminal to a plurality of said poles and further a first current source for supplying current to said first current input terminal and a voltage source for supplying voltage to said voltage input terminal.