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US 2007/0181529 A1Published application
Corona discharge plasma source devices, and various systems and methods of using same
OwnerKrupakar Subramanianinventor
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Abstract
The present invention is generally directed to corona discharge plasma source devices, and various systems and methods for using same. In one illustrative embodiment, the system comprises a process chamber, a support member comprising a plurality of tapered conductive members positioned in the member and a power supply system for applying at least one voltage level to the plurality of tapered conductive members.
Claims58
A system, comprising:
- a process chamber;
- a support member comprising a plurality of tapered conductive members positioned in said support member;
- and
- a power supply system for applying at least one voltage level to said plurality of tapered conductive members.
1 more element
A system, comprising:
- a process chamber;
- a support member comprising a plurality of tapered conductive members positioned in said support member, each of said tapered conductive members having an inlet opening defining an inlet area and an outlet opening defining an outlet area, wherein said outlet area is greater than said inlet area;
- and
- a power supply system for applying at least one voltage level to said plurality of tapered conductive members.
1 more element
A method, comprising:
- positioning a semiconducting substrate in a system comprising a process chamber and a support member comprising a plurality of tapered conductive members positioned in said support member;
- introducing a process gas into said processing chamber;
- and
- applying at least one voltage level to said plurality of tapered conductive members to generate at least one of active neutrals and ions.
1 more element
A method, comprising:
- positioning a semiconducting substrate in a system comprising a process chamber and a support member comprising a plurality of tapered conductive members positioned in said support member, each of said tapered conductive members having an inlet opening defining an inlet area and an outlet opening defining an outlet area, wherein said outlet area is greater than said inlet area;
- introducing a process gas into said processing chamber;
- and
- applying at least one voltage level to said plurality of tapered conductive members to generate at least one of active neutrals and ions.
1 more element
Dependencies are inferred from the claim text.