Method and apparatus for monitoring gas flow amount in semiconductor manufacturing equipment

A gas delivery system for semiconductor processing, comprising:

• at least one gas supplier;
• a process chamber;
• at least one supply line positioned between the gas supplier and the process chamber, the supply line including at least one main valve and at least one gas flow controller;
• an exhaust line in fluid communication with the process chamber and including an exhaust valve positioned downstream thereof;
• and
• a flow amount measuring unit.

A method for detecting gas leaks in semiconductor manufacturing equipment, comprising:

• advancing a predetermined amount of gas through a process chamber into an exhaust line;
• measuring the amount of gas flow in the exhaust line to obtain a measured amount of gas flow;
• comparing the predetermined amount of gas to the measured amount of gas flow;
• and
• determining a presence of a leak when the measured amount of gas flow exceeds the predetermined amount of gas.