Optoelectronic device and fabrication method

A method for making an optoelectronic device, the method comprising:

• forming a porous, film on a substrate by a surfactant temptation technique,
• wherein the porous film includes interconnected pores that are substantially uniformly distributed
• wherein the pores have diameters of between about 1 nm and about 100 nm, and
• wherein neighboring pores are separated by between about 1 nm and about 100 nm;
• and
• substantially filling the pores in the porous film with a pore-filling material,
• wherein the porous film and the pore-filling material have complementary charge transfer properties with respect to each other.

The method of claim 17 wherein the one or more alkoxides include titanium ethoxide or titanium isopropoxide, the one or more surfactants include p123, hexadecyl trimethylammonium bromide (CTAB), or F127, and the one or more condensation inhibitors include hydrochloric acid (HCl).

• The method of claim 21 wherein the alkoxides, surfactants, condensation inhibitors, water, and ethanol are in molar ratios in the following ranges:
• Surfactant/alkoxide:
• a molar ratio ranging from about 1×10−7 to about 0.1,
• Ethanol/alkoxide:
• a molar ratio ranging from about 3 to about 20,
• Condensation Inhibitor/alkoxide:
• a molar ranging ratio from about 1.5×10−5 to about 5.0,
• water/alkoxide:
• a molar ratio ranging from about 1 to about 20.

The system of claim 38, wherein each of the porous charge-splitting networks includes:

• a porous film having interconnected pores that are distributed in a substantially uniform fashion with neighboring pores separated by a distance of between about 1 nm and about 100 nm, wherein the pores are accessible from an underlying layer and/or overlying layer;
• and
• a pore-filling material that substantially fills the pores in the porous film,
• wherein the porous film and the pore-filling material have complementary charge transfer properties with respect to each other.

A method for making a charge-splitting network, the method comprising:

• forming a porous nano-architected, film on a substrate by, and
• substantially filling the pores in the porous nano-architected film with a pore-filling material,
• wherein the porous nano-architected film includes interconnected pores that are substantially uniformly distributed,
• wherein the pores have diameters of between about 1 nm and about 100 nm, and
• wherein neighboring pores are separated by between about 1 nm and about 100 nm,
• wherein the interconnected pores in the surfactant-templated film are accessible from an underlying layer and/or overlying layer,
• wherein the porous film and the pore-filling material have complementary charge transfer properties with respect to each other.

The method of claim 41, wherein the porous-nano-architected film is produced using one or more techniques selected from the following group:

• intercalation and/or grafting of organic or polymeric molecules within a mineral lamellar network;
• synthesis by electrocrystallisation of hybrid molecular assemblies;
• impregnation of preformed inorganic gels,
• synthesis from heterofunctional metallic alkoxides or silsesquioxannes,
• synthesis of hybrid through the connection of well defined functional nanobuilding blocks, and
• templated growth of inorganic or hybrid networks by using organic molecules and macromolecules including surfactants, amines, alkyl ammonium ions, amphiphilic molecules, as structure directing agents.