Plasma source assembly and method of manufacture
AssigneeTokyo Electron Limited
InventorSteven Fink
Life of this patent
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Abstract
A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the helical coil. Preferably, the assembly includes a plenum cooling plate that is configured to supply cooling fluid to a first cooling rod provided within a resonator cavity defined by the chamber wall and the outer shield, and receive cooling fluid from a second cooling rod provided within the resonator cavity. The assembly preferably also includes a spacer provided between the first cooling rod and the second cooling rod, and coil insulators having holes configured to receive the helical coil.
Claims15
A method of manufacturing a plasma processing system, said method comprising the steps of:
- providing a process chamber;
- providing a chuck assembly within the process chamber;
- providing a gas inject assembly opposite the chuck assembly;
- and
- mounting the gas inject assembly to the process chamber using an outer shield, the outer shield comprising a plurality of plates.
A method of manufacturing a plasma source assembly, said method comprising the steps of:
- providing an outer shield;
- providing a dielectric chamber wall;
- and
- mounting a helical coil between the outer shield and the dielectric chamber wall using a coil support means for facilitating repeatable performance of the helical coil.
Dependencies are inferred from the claim text.