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US 2007/0179265 A1Published application
Polymers for use in cleaning compositions
AssigneeCognis IP Management GmbH
InventorsThomas Albers, Wolfgang Denuell, Stephen Gross, Dirk Mampe, Florence Mazuel, Hans-Christian Raths, Christoph Schunicht
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Abstract
Polymers which are suitable for use in cleaning compositions are described. The polymers are comprised of at least three different monomers. The types of monomers and ratios of the monomers in the polymers are further disclosed. Cleaning compositions containing the polymers for treating various surfaces and for use in various applications are also provided.
Claims19
1:
- A water-soluble polymer for use in cleaning compositions comprising at least 3 monomers of the following formulae:
- a) H2C═CR′—CO—NH—R2—N+R3R4R5 X−
- wherein R′ represents a hydrogen atom or an alkyl radical with 1 to 4 C atoms, R2 represents a linear or branched alkytene radical with 1 to 12 C atoms and R3, R4, and R5, independently of one another, each represent a hydrogen atom, an alkyl radical with 1 to 18 C atoms or a phenyl radical, and X− represents an anion selected from the group consisting of a halogen, a sulfate, an alkylsulfate, an hydroxide, a phosphate, an acetate, a formate and an ammonium;
- b) H2C═CR6—CO—NR7R8
- wherein R6 represents a hydrogen atom or an alkyl radical with 1 to 4 C atoms and R7 and R8, independently of one another, each represent a hydrogen atom, an alkyl radical with 1 to 4 C atoms or a C3-C6 cycloalkyl radical, with the proviso that R7 and R8 do not simultaneously represent a hydrogen atom;
- and
- c) acrylic and/or methacrylic acid and salts thereof;
- and
- wherein monomer c) is present in the water-soluble polymer at a maximum of about 25 wt % based on the total weight of the water-soluble polymer.
6 more elements
2:
- The polymer of claim 1 which further comprises a monomer d) selected from the group of C3-C6 singly ethylenically unsaturated carboxylic acids, and half-esters and salts thereof, and H2C═CR—CO—NH—CR′R′R′″—SO3H and salts thereof, wherein R, R′, R′″, and R′″ independently of one another represent a hydrogen atom or an alkyl(ene) radical with 1 to 4 C atoms,
3:
- The polymer of claim 1 wherein monomer d) is substituted for monomer c).
4:
- The polymer of claim 1 wherein monomer a) is 3-trimethylammoniumpropylmethacrylamide chloride.
5:
- The polymer of claim 1 wherein monomer b) is N-isopropylacrylamide.
6:
- The polymer of claim 1 wherein monomer c) is acrylic acid and/or methacrylic acid and salts thereof.
7:
- The polymer of claim 2 wherein monomer d) is 2-acrylamido-2-methyl-1-propane-sulfonic acid.
8:
- The polymer of claim 3 wherein monomer d) is 2-acrylamido-2-methyl-1-propane-sulfonic acid.
9:
- The polymer of claim 1 wherein the monomers a), b), and c) are present in a molar ratio of from about 1:10:1 to 5:10:5, respectively.
10:
- The polymer of claim 9 wherein the molar ratio is from about 3:8:2 to 3:8:1.
11:
- The polymer of claim 2 wherein the monomers a), b), c), and d) are present in a molar ratio of from about 3:8:1:1, respectively.
12:
- The polymer of claim 2 wherein the monomers a), b), c), and d) are present in weight ratios of about 25 to 45%, about 40 to 70%, about 1 to 15%, and about 1 to 15%, respectively, based on 100% weight of the polymer.
13:
- A cleaning composition which comprises the polymer of claim 1.
14:
- A cleaning composition which comprises the polymer of claim 2.
15:
- A cleaning composition which comprises the polymer of claim 3.
16:
- A cleaning composition which comprises a polymer comprising monomers of trimethylammoniumpropylmethacrylamide chloride, N-isopropylacrylamide, acrylic acid and/or methacrylic acid and salts thereof;
- and 2-acrylamido-2-methyl-1-propane-sulfonic acid.
17:
- The cleaning composition of claim 16 wherein the composition has a pH of greater than or equal to 8.
18:
- The cleaning composition of claim 16 wherein the composition has a pH of less than or equal to 6.
19:
- The cleaning composition of claim 16 wherein the polymer is present in an amount of from about 0.01% to about 5 wt %.