Device manufacturing method and device
AssigneeASML Netherlands B.V.
InventorsJohannes Zuilhof, Klaus Simon, Ernst Sudholter, Qiao-Yu Sun
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Abstract
A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.
Claims20
A device manufacturing method comprising the steps of:
- (a) providing a polished silicon substrate having a background portion and one or more target portions, said background and target portions having Si—H bonds on the surface;
- (b) irradiating said one or more target portions using a patterned beam of radiation and in the presence of oxygen to provide a layer of silicon oxide on said target portion(s);
- (c) reacting at least a part of said background portion with a first composition comprising one or more compounds selected from 1-alkenes and 1-alkynes;
- (d) removing said layer of silicon oxide from said target portion(s);
- (e) reacting one or more target portions with a further composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, to covalently attach said one or more compounds to said target portion(s).
A device manufacturing method comprising the steps of:
- (a1) providing a polished silicon substrate having a background portion and one or more target portions, said background and target portions having Si—H bonds on the surface;
- (b1) reacting one or more target portions with a further composition comprising one or more compounds selected from 1-alkenes and 1-alkynes, to covalently attach said one or more compounds to said target portion(s);
- and
- (c1) reacting at least a part of said background portion with a first composition comprising one or more compounds selected from 1-alkenes and 1-alkynes.
A device comprising:
- a polished silicon substrate having a background portion and one or more target portions, at least one of said target portions having a part of a transistor structure in its surface;
- an organic monolayer which is directly coupled to at least a part of the surface of the silicon substrate by covalent bonds, said organic monolayer comprising receptor compounds, each of which is capable of interacting with a chemical or biological substance, in area(s) which cover the or each target portion having a part of a transistor structure;
- wherein the part of a transistor structure combined with the organic monolayer containing receptor compounds forms a field effect transistor.
Dependencies are inferred from the claim text.