Polymer, resist protective coating material, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa, Yuji Harada
Life of this patent
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Abstract
A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
Claims14
A polymer comprising repeat units having the general formula (1):
- wherein R1 and R2 are each independently hydrogen or a straight, branched or cyclic C1-C12 alkyl group, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached, and R30 is hydrogen or methyl.
A polymer comprising repeat units having the general formula (1)-1:
- wherein R1 and R2 each are hydrogen or a straight, branched or cyclic C1-C12 alkyl group, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached, R30 and R40 each are hydrogen or methyl, R5 is a straight or branched C2-C10 alkyl group having at least one fluorine atom substituted thereon, the subscripts “a” and “b” are numbers in the range:
- 0<a<1, 0<b<1, and 0<a+b≦1.
A resist protective coating material comprising a polymer having a partial structure of the general formula (2):
- wherein R1 and R2 each are hydrogen or a straight, branched or cyclic C1-C12 alkyl group, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached, and X is —O— or —C(═O)—O—.
Dependencies are inferred from the claim text.