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US 2007/0178393 A1Published application
Reflective photomask and method of fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Hong Park, Han-Ku Cho, Seong-Sue Kim, Sang-Gyun Woo, Suk-Joo Lee
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Abstract
A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.
Claims20
A reflective photomask comprising:
- a projecting pattern selectively formed on a substrate;
- and
- a reflective layer on the substrate and the projecting pattern.
A method of fabricating a photomask, the method comprising:
- selectively forming a projecting pattern on a substrate;
- and
- forming a reflective layer on the substrate and the projecting pattern.
Dependencies are inferred from the claim text.