Exposure mask, liquid crystal display device using the same, and method of manufacturing liquid crystal display device using the same
OwnerSung Taek Yun, Yong Gi Park +1inventors
InventorsSung Taek Yun, Yong Gi Park, Yong Koo Her
Life of this patent
Estimating the term…
Abstract
An exposure mask suitable for forming a color filter for compensating for a difference in color reproduction between a reflective area and a transmissive area including first areas causing a part of a thin film to remain as a thin film pattern by controlling an incident light, second areas removing the other part of the thin film by controlling the incident light contrary to the first areas and dummy areas extended from edges of the first areas and formed such that the thin film pattern substantially corresponds to the first areas.
Claims17
An exposure mask, comprising:
- first areas causing a part of a thin film to remain as a thin film pattern by controlling an incident light;
- second areas removing the other part of the thin film by controlling the incident light contrary to the first areas;
- and
- dummy areas extended from edges of the first areas and formed such that the thin film pattern substantially corresponds to the first areas.
A method of manufacturing a liquid crystal display device, comprising the steps of:
- forming a color photoresist on an insulating substrate;
- exposing the color photoresist using an exposure mask comprising first and second areas controlling an incident light contrary to each other and dummy areas extended from edges of the first areas;
- and
- forming a color filter substantially corresponding to the first areas of the exposure mask, the forming a color filter comprising developing the color photoresist.
A liquid crystal display device, comprising:
- a color filter formed according to a corresponding color in each of subpixel areas comprising a reflective area and a transmission area;
- an alignment layer formed on an insulating substrate where the color filter is formed;
- and
- a slit formed on the color filter of the reflective area, the slit being long in a rubbing direction of the alignment layer.
Dependencies are inferred from the claim text.