Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
AssigneeHoya Corporation
InventorsHiroyuki Ishida, Tamiya Aiyama, Koichi Maruyama
Life of this patent
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Abstract
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
Claims31
A mask blank information acquisition method for acquiring mask blank information being information relating to a mask blank having a plurality of films stacked on a surface of a substrate, wherein:
- said mask blank information comprises substrate information and one or more film information or two or more film information;
- said substrate information comprises position information in a plane coordinate system corresponding to the surface of the substrate and state information indicating a state of the substrate correlated with the position information;
- said film information each comprises position information in a plane coordinate system corresponding to the corresponding one of the films and state information indicating a state of said film correlated with the position information;
- and
- said plane coordinate systems of said substrate information and said film information comprised in said mask blank information have predetermined correlation with each other.
A mask blank information acquisition system for acquiring mask blank information being information relating to a mask blank having a plurality of films stacked on a surface of a substrate, comprising:
- at least two information acquisition means among;
- means for acquiring substrate information relating to a state of the substrate;
- means for acquiring first film information relating to a state of a first film formed on the surface of the substrate or on another film formed on the surface of the substrate;
- means for acquiring second film information relating to a state of a second film being a film other than said first film formed on the surface of said substrate, and
- means for producing mask blank information comprising the information acquired by said information acquisition means.
Dependencies are inferred from the claim text.