Infrared shielding film-coated glass plate and process for its production
AssigneeAsahi Glass Company, Limited
InventorsHirokazu KODAIRA, Hiroyuki Tomonaga, Kazuo Sunahara
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Abstract
An infrared shielding film-coated glass plate comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises fine ITO particles having an average primary particle diameter of at most 100 nm dispersed in a matrix containing silicon oxide and titanium oxide and has a film thickness of from 100 to 1,500 nm.
Claims12
An infrared shielding film-coated glass plate comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises fine ITO particles having an average primary particle diameter of at most 100 nm dispersed in a matrix containing silicon oxide and titanium oxide and has a film thickness of from 100 to 1,500 nm.
A process for producing an infrared shielding film-coated glass plate, which comprises:
- a step of applying a dispersion liquid comprising fine ITO particles having an average primary particle diameter of at most 100 nm, a silicon compound capable of forming a silicone oxide gel, a titanium compound capable of forming a titanium oxide gel and an organic solvent, to the surface of a glass substrate and drying the dispersion liquid to form a fine ITO particles-dispersed layer containing the silicon compound and the titanium compound and/or containing a gel thereof, and
- a step of firing the glass substrate having the above layer formed thereon in an atmosphere containing oxygen at such a temperature that the glass substrate temperature is from 400° C. to 750° C.
Dependencies are inferred from the claim text.