Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device

A vapor deposition crucible used for a vapor deposition source in a thin-film forming apparatus comprising:

• a vessel having a portion where material to be evaporated from the vapor deposition crucible is accommodated;
• an orifice plate having a first opening and being provided in the vessel;
• and
• a discharge plate provided on outer side of the vessel to oppose the orifice plate, and having a second opening which discharges the material evaporated in the vapor deposition crucible to the exterior of the vapor deposition crucible;
• wherein
• an evaporation chamber is formed in the vessel between the portion where the material is filled and the orifice plate;
• and
• a space is defined between the orifice plate and the discharge plate, and this space serves a pressure-controlling chamber in which the pressure is controlled in relation to the evaporation chamber.

A method for producing a display device by vapor depositing an organic material on main surface of a substrate, comprising the steps of:

• evaporating the organic material in a first space;
• introducing the evaporated organic material from the first space to a second space in which vapor pressure of the organic material is maintained to the level not higher than the first space;
• and
• introducing the evaporated organic material which has been introduced in the second space to a third space which is maintained at a pressure lower than the first space and the second space, and depositing the evaporated organic material onto the main surface of the substrate disposed in the third space.