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US 2007/0177870 A1Published application
Substrate processing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorTetsuya Hamada
Life of this patent
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Abstract
A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a placement/bake unit. A substrate that has been subjected to exposure processing in the exposure device is subjected to cleaning and drying processing in a second cleaning/drying processing unit, and is then transported to a placement/heating unit. In the placement/heating unit, the substrate is subjected to post-exposure bake processing.
Claims15
A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:
- a processing section for subjecting a substrate to processing;
- and
- an interface that transfers and receives the substrate between said processing section and said exposure device,
- said processing section including
- a photosensitive film formation unit that forms a photosensitive film composed of a photosensitive material on the substrate,
- said interface including
- a thermal processing unit that subjects the substrate after exposure processing by said exposure device to thermal processing,
- a first transport unit that transports the substrate between said processing section and said thermal processing unit, and
- a second transport unit that transports the substrate between said exposure device and said thermal processing unit,
- said second transport unit carrying the substrate after the exposure processing by said exposure device into said thermal processing unit,
- said first transport unit carrying the substrate after the thermal processing by said thermal processing unit out of said thermal processing unit.
8 more elements
Dependencies are inferred from the claim text.