Method and system for patterning alignment marks on a transparent substrate

A method for forming alignment marks on a substrate, the method comprising:

• depositing a light reflective layer over an optically transparent substrate;
• forming a mask pattern;
• removing the light reflective layer not covered by the mask pattern;
• and
• removing the mask pattern to form an alignment mark.

A device over optically transparent substrate comprising:

• a substantially optically transparent substrate;
• at least one optically partially transparent alignment mark on the transparent substrate;
• and
• a plurality of reflective mirrors.

A device over optically transparent substrate comprising:

• a substantially optically transparent substrate;
• at least one optically partially transparent alignment mark on the transparent substrate;
• and
• a plurality of imaging pixels.

A micro electro-mechanical systems device comprising:

• an optically transparent substrate;
• at least one optically partially transparent alignment mark on the optically transparent substrate;
• a plurality of reflective elements attached to the optically transparent substrate;
• and
• a second substrate aligned with the optically transparent substrate and coupled with the optically transparent substrate to actuate the plurality of reflective elements.