Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
AssigneeNikon Corporation
InventorYuichi Shibazaki
Life of this patent
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Abstract
A substrate holder includes a base; a first holding portion which is formed on the base and which attracts and holds a substrate; and a second holding portion which is formed on the base and which attracts and holds a plate member in the vicinity of the substrate attracted and held by the first holding portion. In an exposure apparatus including such a substrate holder, the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.
Claims89
A substrate-holding unit which holds a process substrate, comprising:
- a base member;
- a first holding portion which is formed in the base member and which attracts and holds the process substrate;
- and
- a second holding portion which is formed in the base member and which attracts and holds a plate in the vicinity of the process substrate attracted and held by the first holding portion.
An exposure apparatus which exposes a process substrate by projecting an image of a pattern onto the process substrate, the exposure apparatus comprising:
- a first plate;
- a second plate;
- and
- a substrate-holding unit including a first holding portion which attracts and holds the process substrate, a second holding portion which attracts and holds the first plate in the vicinity of the process substrate attracted and held by the first holding portion, and a third holding portion which attracts and holds the second plate in the vicinity of the process substrate attracted and held by the first holding portion.
A liquid-repelling plate to be used for an exposure apparatus which exposes a process substrate by radiating an exposure light beam through a liquid onto the process substrate held by a substrate-holding unit, wherein:
- the liquid-repelling plate is attracted and held by the substrate-holding unit to form a flat portion having a liquid-repellent surface in the vicinity of the process substrate attracted and held by the substrate-holding unit.
A substrate-holding unit which holds a process substrate to be irradiated with an exposure light beam through a liquid, the substrate-holding unit comprising:
- a base member;
- a first holding portion which is formed in the base member and which holds the process substrate;
- a second holding portion which is formed in the base member and which holds a plate in the vicinity of the process substrate held by the first holding portion;
- and
- a liquid recovery port which is formed in the base member and which recovers the liquid inflowed through a gap between the process substrate held by the first holding portion and the plate held by the second holding portion.
A substrate-holding unit which holds a process substrate to be irradiated with an exposure light beam through a liquid, the substrate-holding unit comprising:
- a base member;
- a first holding portion which is formed in the base member and which holds the process substrate;
- and
- a second holding portion which is formed in the base member and which holds a plate in the vicinity of the process substrate held by the first holding portion;
- wherein the plate, which is held by the second holding portion, has a first surface which is substantially flush with a surface of the process substrate, and a second surface which is opposite to a back surface of the process substrate at a circumferential edge of the process substrate held by the first holding portion.
A substrate stage which is movable while holding a process substrate to be irradiated with an exposure light beam, the substrate stage comprising:
- a base member;
- a plate;
- a first holding portion which is formed in the base member and which detachably holds the process substrate;
- and
- a second holding portion which is formed in the base member and which detachably holds the plate in the vicinity of the process substrate held by the first holding portion.
(canceled)
An exposure method for exposing a process substrate with a predetermined pattern, the exposure method comprising:
- placing the process substrate in a substrate holder on a first surface thereof with a predetermined gap between the process substrate and the flat surface;
- exposing the process substrate by radiating an exposure light beam onto the process substrate through a liquid;
- and
- recovering the liquid inflowed through the gap, after completion of exposure process for the process substrate.
Dependencies are inferred from the claim text.