Exposure apparatus and device manufacturing method
OwnerKeiko Chibainventor
Life of this patent
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Abstract
An exposure apparatus exposes a substrate via liquid, and includes a liquid holding plate configured to hold the liquid, and arranged around the substrate, and a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.
Claims8
An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising:
- a liquid holding plate configured to hold the liquid, and arranged around the substrate;
- and
- a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.
An exposure apparatus configured to expose a substrate via liquid, said exposure apparatus comprising:
- a liquid holding plate configured to hold the liquid, and arranged around the substrate;
- and
- a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of an organic material that contains chlorine.
A device manufacturing method comprising:
- exposing a substrate via liquid using an exposure apparatus;
- and
- developing the substrate that has been exposed,
- wherein the exposure apparatus includes:
- a liquid holding plate configured to hold the liquid, and arranged around the substrate;
- and
- a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or having a layer or modified layer of polyparaxylene resin.
A device manufacturing method comprising:
- exposing a substrate via liquid using an exposure apparatus;
- and
- developing the substrate that has been exposed,
- wherein the exposure apparatus includes:
- a liquid holding plate configured to hold the liquid, and arranged around the substrate;
- and
- a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of an organic material that contains chlorine.
Dependencies are inferred from the claim text.