Microswitching device and method of manufacturing the same

A method of making a microswitching device which comprises:

• a base;
• a fixed portion joined to the base;
• a movable portion extending along the base and having a fixed end fixed to the fixed portion;
• a movable contact electrode film and movable driving electrode film provided on a side of the movable portion opposite the base;
• a pair of fixed contact electrodes each joined to the fixed portion and each having a region opposing the movable contact electrode film;
• and a fixed driving electrode having a region opposing the movable driving electrode film and joined to the fixed portion;
• the method comprising the steps of:
• preparing a material substrate having a stacked structure including a first layer, a second layer, and an intermediate layer between the first and the second layers;
• forming a conductive film on the first layer;
• forming a movable contact electrode film and a movable driving electrode film precursor by patterning the conductive film;
• and
• forming a movable driving electrode film by performing etching on the movable driving electrode film precursor, the movable driving electrode film being thinner than the movable contact electrode film.

A method of making a microswitching device which comprises:

• a base;
• a fixed portion joined to the base;
• a movable portion extending along the base and having a fixed end fixed to the fixed portion;
• a movable contact electrode film and movable driving electrode film provided on a side of the movable portion opposite the base;
• a pair of fixed contact electrodes each joined to the fixed portion and each having a region opposing the movable contact electrode film;
• and a fixed driving electrode having a region opposing the movable driving electrode film and joined to the fixed portion;
• the method comprising the steps of:
• preparing a material substrate having a stacked structure including a first layer, a second layer, and an intermediate layer between the first and the second layers;
• forming a conductive film on the first layer;
• forming on the conductive film a first mask pattern having a pattern shape corresponding to the movable contact electrode film;
• performing etching on the conductive film with use of the first mask pattern until partway in the thickness direction of the conductive film;
• forming on the conductive film a second mask pattern having a pattern shape corresponding to the movable driving electrode film;
• and
• performing etching on the conductive film with use of the first and the second mask patterns to form a movable contact electrode film and a movable driving electrode film which is thinner than the movable contact electrode film.