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AssigneeHirofumi Takikawa and Daiken Chemical
InventorsHirofumi Takikawa, Yoshimi Nishimura, Akio Harada
Estimating the term…
A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma processed objects having target quantities are realized. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.
In a power supply circuit for plasma generation by which said plasma is generated due to discharge occurred between discharge generating electrodes composed of first and second electrodes by applying an alternating high voltage to said discharge generating electrodes, said power supply circuit for plasma generation comprising:
In a plasma generating apparatus by which said plasma is generated due to discharge occurred between discharge generating electrodes composed of first and second electrodes by applying an alternating high voltage to said discharge generating electrodes, said plasma generating apparatus comprising:
Dependencies are inferred from the claim text.