Mold for imprint, process for producing minute structure using the mold, and process for producing the mold
AssigneeCanon Kabushiki Kaisha
InventorsTakashi Nakamura, Toru Den
Life of this patent
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Abstract
A mold for imprint capable of forming a reduced seam or seamless pattern, on a surface of a substrate, having larger area than that of the mold includes a first pattern area comprising a plurality of first recesses; and a second pattern area, comprising a plurality of second recesses, for being used as an alignment mark. The first pattern area and the second pattern area have an equal height at their outermost surfaces. The first recesses and the second recesses have different depths. The first pattern area and the second pattern area have an equal cyclic interval.
Claims12
A mold for imprint, comprising:
- a first pattern area comprising a plurality of first recesses;
- and
- a second pattern area, comprising a plurality of second recesses, for being used as an alignment mark,
- wherein said first pattern area and said second pattern area have an equal height at their outermost surfaces,
- wherein the first recesses and the second recesses have different depths, and
- wherein said first pattern area and said second pattern area have an equal cyclic interval.
A mold for imprint, comprising:
- a first pattern having a projection and recess shape for being transferred onto a member to be processed;
- and
- a second pattern having a projection and recess shape for being used as an alignment mark,
- wherein the projection and recess shape of said second pattern has a height different from that of the projection and recess shape of said first pattern and has a cyclic interval equal to that of the projection and recess shape of said first pattern.
A process for producing a member having an imprint pattern, comprising:
- oppositely disposing a substrate having a member to be processed and a mold having a first pattern for forming an imprint pattern to be transferred onto the member to be processed and a second pattern to be utilized as an alignment mark;
- simultaneously transferring the first pattern and second pattern of the mold onto the member to be processed;
- and
- forming an imprint pattern on a surface of a substrate by utilizing projections and recesses formed on the member to be processed by the first pattern and the second pattern.
Dependencies are inferred from the claim text.