Regularly-aligned nano-structured material and method for producing the same
AssigneeFUJIFILM Corporation
InventorKoukichi Waki
Life of this patent
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Abstract
A nano-structured material comprising a depression/projection-patterned substrate and a sol-gel film having at least one group selected from the group consisting of an alkyl group, a phenyl group, an epoxy group and an amino group in the depressions of the patterned substrate, wherein polystyrene particles having a particle size of from 10 to 200 nm, or holes having a hole size of from 10 to 200 nm that may be filled with nanoparticles are regularly aligned in the depressions of the patterned substrate.
Claims12
A nano-structured material comprising a depression/projection-patterned substrate and a sol-gel film having at least one group selected from the group consisting of an alkyl group, a phenyl group, an epoxy group and an amino group in the depressions of the patterned substrate, wherein polystyrene particles having a particle size of from 10 to 200 nm, or holes having a hole size of from 10 to 200 nm that may be filled with nanoparticles are regularly aligned in the depressions of the patterned substrate.
Dependencies are inferred from the claim text.