Alignment systems and methods for lithographic systems

An automatic process control system for the manufacture of microdevices, comprising:

• a data processing unity adapted to receive data from an alignment mark detection system having a plurality of detector channels, wherein said data processing unit determines an updated processing strategy based on data received from said alignment mark detection system and outputs a signal to alter a processing step based on said updated processing strategy, and wherein said plurality of detector channels of said alignment mark detection system provide a corresponding plurality of signals substantially simultaneously during detection of an alignment mark.

A method of automatic equipment control for the manufacture of microdevices, comprising:

• receiving data from an alignment mark detection system having a plurality of detector channels;
• determining an updated processing strategy based on said received data from said alignment mark detection system;
• and altering a processing step based on said updated processing strategy, wherein said plurality of detector channels of said alignment mark detection system provide a corresponding plurality of signals substantially simultaneously during detection of an alignment mark.