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AssigneeVarian, Inc.
InventorGregory Wells
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Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to one or more main electrodes and compensation electrodes. The voltages on the one or more compensation electrodes may be adjusted to be proportional to the voltages on the main electrodes. The adjustment(s) may be done to optimize the RF field for different modes of operation such as ion ejection and ion dissociation. For dissociation and other procedures involving ion excitation, the voltages applied to the one or more compensation electrodes may be different from the voltages applied to the one or more main electrodes. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and a device or circuitry for applying the various desired voltages.
A method for adjusting an RF field in an electrode structure, the electrode structure including a plurality of main electrodes coaxially disposed about a central axis and extending generally in the direction of the central axis, the main electrodes defining an interior space extending along the central axis, the method comprising:
An electrode structure for manipulating ions, comprising:
Dependencies are inferred from the claim text.