3d lithography with laser beam writer for making hybrid surfaces
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorXinbing Liu
Life of this patent
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Abstract
A method of etching a feature in a surface of a substrate. The substrate is provided. A photoresist layer is formed on the surface of the substrate. A thickness profile of the formed photoresist layer is determined. A grayscale scanning pattern is determined based on the feature and the thickness profile of the photoresist layer. The determined grayscale scanning pattern is laser written on the photoresist layer to expose a portion of the photoresist layer. The exposed portion of the photoresist layer is removed to form a grayscale pattern in the photoresist layer. The photoresist layer and the surface of the substrate are etched to form the feature in the surface of the substrate.
Claims20
A method of etching a feature in a non-planar surface of a substrate, comprising the steps of:
- a) forming a photoresist layer on the non-planar surface of the substrate;
- b) determining a grayscale scanning pattern based on the feature and the non-planar surface of the substrate, the grayscale scanning pattern including information for maintaining a focus of a beam spot on the photoresist layer throughout the grayscale scanning pattern;
- c) laser writing the grayscale scanning pattern determined in step (b) on the photoresist layer to expose a portion of the photoresist layer;
- d) removing the portion exposed in step (c) to form a grayscale pattern in the photoresist layer;
- and
- e) etching the photoresist layer and the non-planar surface of the substrate to form the feature.
A method of etching a feature in a surface of a substrate, comprising the steps of:
- a) forming a photoresist layer on the surface of the substrate;
- b) determining a thickness profile of the photoresist layer;
- c) determining a grayscale scanning pattern based on the feature and the thickness profile of the photoresist layers;
- d) laser writing the grayscale scanning pattern determined in step (c) on the photoresist layer to expose a portion of the photoresist layer;
- e) removing the portion exposed in step (d) to form a grayscale pattern in the photoresist layer;
- and
- f) etching the photoresist layer and the surface of the substrate to form the feature.
A method of etching a feature in a non-planar mold surface of a mold part, comprising the steps of:
- a) providing the mold part;
- b) forming a photoresist layer on the non-planar mold surface of the mold part;
- c) determining a grayscale scanning pattern based on the feature and the non-planar mold surface of the mold part, the grayscale scanning pattern including information for maintaining a focus of a beam spot on the photoresist layer throughout the grayscale scanning pattern;
- d) laser writing the grayscale scanning pattern determined in step (b) on the photoresist layer to expose a portion of the photoresist layer;
- e) removing the portion exposed in step (c) to form a grayscale pattern in the photoresist layer;
- f) etching the photoresist layer and the non-planar mold surface of the mold part to form the feature;
- and
- g) forming a release layer on at least a portion of the non-planar mold surface of the mold part to reduce adherence by a mold product to the mold part during molding.
Dependencies are inferred from the claim text.