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US 2007/0175748 A1Published application
Method of manufacturing at least one sputter-coated substrate and sputter source
AssigneeOc Oerlikon Balzers AG
InventorsFachri Atamny, Stanislav Kadlec, Siegfried Krassnitzer, Walter Haag, Pius Gruenenfelder
Life of this patent
Estimating the term…
Abstract
Sputtering is performed by making use of a stationary magnetic field (Hs). Uneroded areas of the sputtering surface (3) which are subject to re-deposition are minimized or omitted by modulating the stationary magnetic field (Hs) adjacent to one of the magnetic poles responsible for the stationary magnetic field, by superimposing a modulating magnetic field (Hm) to said stationary field (Hs).
Claims24
1-23. (canceled)
A method of manufacturing at least one sputter coated substrate comprising:
- magnetic field enhanced sputter coating said at least one substrate from a target arrangement comprising at least one sputter target having a sputtering surface, thereby
- generating a time varying magnetic field on said surface by a first stationary and elongated arrangement of magnetic poles and a second stationary and elongated arrangement of magnetic poles, said first and second stationary and elongated arrangements being disposed mutually spaced and one along the other and at least one thereof beneath said sputtering surface, said first and second stationary and elongated arrangements commonly generating a stationary magnetic field having a pattern of magnetic field lines which is arcing above said surface as considered in respective planes perpendicular to said surface and tunnel-like considered in a direction perpendicular to said planes;
- superimposing a modulating magnetic field to said stationary magnetic field adjacent one of said first and of said second stationary and elongated arrangements of magnetic poles and along at least a predominant part of said one stationary and elongated arrangement.
A sputtering source comprising:
- at least one sputter target having a sputtering surface,
- a first stationary and elongated arrangement of magnetic poles along said target,
- a second stationary and elongated arrangement of magnetic poles, disposed mutually spaced and along said first stationary and elongated arrangement of magnetic poles;
- at least one of said first and of said second stationary and elongated arrangements of magnetic poles being disposed beneath said sputtering surface, said first and second stationary and elongated arrangements commonly generating a stationary magnetic field having a pattern of magnetic field lines which is arcing upon said sputtering surface as considered in respective planes perpendicular to said sputtering surface and tunnel-like considered in a direction perpendicular to said planes,
- a dynamic arrangement of at least one of spaced apart ferromagnetic members and of magnetic poles drivingly movable adjacent one of said first and second stationary and elongated arrangements of magnetic poles.
2 more elements
A method of modulating plasma density comprising
- Generating a magnetic field in a plasma exclusively by a drum with a helical pattern of magnetic poles, rotated about the axis of said drum.
A method of manufacturing at least one sputter-coated substrate comprising
- Magnetic field-enhanced sputter-coating said at least one substrate from a target arrangement comprising at least one sputter target having a sputtering surface, thereby
- Generating a time-varying magnetic field on said surface by a first stationary and elongated arrangement of magnetic poles and a second stationary and elongated arrangement of magnetic poles, said first and second stationary and elongated arrangements being disposed mutually spaced and one along the other and at least one thereof beneath said sputtering surface, said first and second stationary and elongated arrangements commonly generating a stationary magnetic field having a pattern of magnetic field lines which is arcing above said surface as considered in respective planes perpendicular to said surface and tunnel-like considered in a direction perpendicular to said planes;
- Controllably unbalancing said stationary magnetic field in a modulating manner adjacent to at least one of said first and of said second stationary and elongated arrangements of magnetic poles.
Dependencies are inferred from the claim text.