Method of generating discharge plasma
AssigneeNGK Insulators, Ltd.
InventorsTakao Saito, Tatsuya Terazawa, Yoshimasa Kondo
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Abstract
A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm−3 or larger and an electron temperature of 1.5 eV or lower at a supplied power of 1.0 W/cm2 or more per a unit area of a discharge electrode.
Claims10
A method of generating discharge plasma by applying a pulse voltage on a process gas, wherein said pulse voltage comprises a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less.
Dependencies are inferred from the claim text.