Apparatus for Treating Plasma and Method for Cleaning the Same
OwnerWeon-Hong Kim, Seok-Jun Won +4inventors
InventorsWeon-Hong Kim, Seok-Jun Won, Dae-Jin Kwon, Min-Woo Song, Ju-Youn Kim, Jung-Min Park
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Abstract
An apparatus for treating plasma includes an inner chamber, an outer chamber receiving the inner chamber and including a gas supplier that supplies a gas into the inner chamber, an inner electrode disposed in the inner chamber, and a plasma generator supplying power independently to the inner electrode and the inner chamber.
Claims16
An apparatus for treating plasma, the apparatus comprising:
- an inner chamber;
- an outer chamber receiving the inner chamber and including a gas supplier than supplies gas into the inner chamber;
- an inner electrode disposed in the inner chamber;
- and
- a plasma generator supplying power independently to the inner electrode and the inner chamber.
A method for cleaning an apparatus for treating plasma comprising an inner chamber, an outer chamber receiving the inner chamber and including a gas supplier that supplies a gas into the inner chamber, an inner electrode disposed in the inner chamber, and a plasma generator supplying power independently to the inner electrode and the inner chamber, the method comprising:
- supplying a process gas into the inner chamber to form a thin layer on a substrate seated inside the inner chamber;
- supplying a cleaning gas into the inner chamber;
- and
- supplying high-frequency power independently to the inner electrode and the inner chamber, and using plasma generated from the cleaning gas to clean the inner chamber.
Dependencies are inferred from the claim text.