Substrate processing system, substrate processing method, recording medium and software

A substrate processing system comprising:

• a processing tank for processing substrates with a processing liquid;
• a drying unit disposed above the processing tank;
• and
• a carrying mechanism for carrying the substrates between the processing tank and the drying unit;
• wherein the drying unit can be set in an open state in which the drying unit is opened into the outside atmosphere when the carrying mechanism carries the substrates into the processing tank or a closed state in which the interior of the drying unit is isolated from the outside atmosphere, and a controller sets the drying unit selectively in the open state in which the drying unit is opened into the outside atmosphere or the closed state in which the interior of the drying unit is isolated from the outside atmosphere.

A substrate processing method to be carried out by a substrate processing system including a processing tank for processing substrates and a drying unit disposed above the processing tank, said substrate processing method comprising:

• a chemical processing step of chemically processing substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrates by the drying unit;
• wherein fresh air is supplied into the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• an inert gas is supplied into the drying unit and the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step after the chemical contained in the processing tank has been replaced with the rinsing liquid.

A substrate processing method to be carried out by a substrate processing system including a processing tank for processing substrates, a drying unit disposed above the processing tank, having an open end, and a top cover for covering the open end, said substrate processing method comprising:

• a loading step of opening the top cover and carrying substrates through the open end of the drying unit into the processing tank;
• a chemical processing step of chemically processing the substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrate by the drying unit with the open end closed by the top cover;
• wherein the top cover is removed to open the open end of the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• the open end of the drying unit is covered with the top cover, an inert gas is supplied into the drying unit and the drying unit is exhausted after the chemical contained in the processing tank has been replaced with the rinsing liquid.

A recording medium storing software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates and a drying unit disposed above the processing tank, to make the substrate processing system carry out a substrate processing method comprising:

• a chemical processing step of chemically processing substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrates by the drying unit;
• wherein fresh air is supplied into the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• after the chemical contained in the processing tank has been replaced with the rinsing liquid, an inert gas is supplied into the drying unit and the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step.

Software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates and a drying unit disposed above the processing tank, to make the substrate processing system carry out a substrate processing method comprising:

• a chemical processing step of chemically processing substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrates by the drying unit;
• wherein fresh air is supplied into the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• after the chemical contained in the processing tank has been replaced with the rinsing liquid, an inert gas is supplied into the drying unit and the drying unit is exhausted at a discharge rate lower than that at which the drying unit is exhausted during the chemical processing step.

A recording medium storing software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates, and a drying unit disposed above the processing tank, having an open end, and provided with a top cover covering the open end, to make the substrate processing system carry out a substrate processing method comprising:

• a loading step of opening the top cover and carrying substrates through the open end of the drying unit into the processing tank;
• a chemical processing step of chemically processing the substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrates by the drying unit with the open end closed by the top cover;
• wherein the top cover is removed to open the open end of the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• after the chemical contained in the processing tank has been replaced with the rinsing liquid, the open end of the drying unit is covered with the top cover, an inert gas is supplied into the drying unit and the drying unit is exhausted.

Software to be executed by a control computer for controlling a substrate processing system, including a processing tank for processing substrates, and a drying unit disposed above the processing tank and having an open end and provided with a top cover covering the open end, to make the substrate processing system carry out a substrate processing method comprising:

• a loading step of opening the top cover and carrying substrates through the open end of the drying unit into the processing tank;
• a chemical processing step of chemically processing the substrates with a chemical contained in the processing tank;
• a processing liquid changing step of replacing the chemical contained in the processing tank with a rinsing liquid;
• and
• a drying step of drying the substrates by the drying unit with the open end closed by the top cover;
• wherein the top cover is removed to open the open end of the drying unit and the drying unit is exhausted of gases during the chemical processing step, and
• after the chemical contained in the processing tank has been replaced with the rinsing liquid, the open end of the drying unit is covered with the top cover, an inert gas is supplied into the drying unit and the drying unit is exhausted.