Method for correcting a mask design layout
AssigneesThe Regents of the Univerisity of California, The Regents of the University of Michigan
InventorsAndrew Kahng, Puneet Gupta, Dennis Sylvester, Jie Yang
Life of this patent
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Abstract
A method for performing a mask design layout resolution enhancement includes determining a level of correction for the design layout for a predetermined parametric yield with a minimum total correction cost. The design layout is corrected at the determined level of correction based on a correction algorithm if the correction is required. In this manner, only those printed features on the design layout that are critical for obtaining the desired performance yield are corrected, thereby reducing the total cost of correction of the design layout.
Claims6
A method for performing a mask design layout resolution enhancement, comprising:
- determining a first level of correction for the mask design layout for a predetermined parametric yield with a minimum total correction cost;
- and
- correcting the mask design layout at said first level of correction based on a correction algorithm if said first level of correction is determined to be required.
2-5. (canceled)
9-38. (canceled)
Dependencies are inferred from the claim text.