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AssigneesHitachi, Ltd., Hitachi Chemical Company, Ltd.
InventorsTakeshi Uchida, Tetsuya Hoshino, Hiroki Terazaki, Yasuo Kamigata, Naoyuki Koyama, Yoshio Honma, Seiichi Kondoh
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Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
A metal-polishing liquid material comprising an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water, wherein the dissolution promoter is a surfactant, said surfactant being at least one selected from the group consisting of esters, ethers, polysaccharides, salts of amino acids, polycarboxylic acids, salts of polycarboxylic acids, vinyl polymers, sulfonic acids, sulfonates, and amides.
Dependencies are inferred from the claim text.