Metal-polishing liquid and chemical-mechanical polishing method using the same
AssigneeFUJIFILM Corporation
InventorKatsuhiro Yamashita
Life of this patent
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Abstract
A metal-polishing liquid includes colloidal silica and a compound represented by Formula (I) or a compound represented by Formula (II). The colloidal silica is substituted by aluminum atoms at least one portion of the silicon atoms on the surfaces thereof. In Formula (I), R1 represents an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; R2 represents hydrogen atom, an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; m represents an integer from 0 to 6. In Formula (II), R3 represents an alkyl group or aryl group; n represents an integer from 1 to 30. R1—OOC—(CH2)m—COO—R2 Formula (I) R3—O—(CH2CH2O)n—SO3H Formula (II)
Claims19
A metal-polishing liquid comprising:
- a colloidal silica at least one portion of the silicon atoms on the surfaces of which is substituted by aluminum atoms;
- and
- a compound represented by the following Formula (I) or a compound represented by the following Formula (II):
- R1—OOC—(CH2)m—COO—R2 Formula (I)
- wherein in Formula (I), R1 represents an alkyl group, an alkynyl group, an alkenyl group, an allyl group or an aryl group;
- R2 represents a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an allyl group or an aryl group;
- and m represents an integer of from 0 to 6, and
- R3—O—(CH2CH2O)n—SO3H Formula (II)
- wherein in Formula (II), R3 represents an alkyl group or an aryl group;
- and n represents an integer of from 1 to 30.
Dependencies are inferred from the claim text.