Semiconductor thin film forming system
OwnerHiroshi TANABE, Tomoyuki Akashi +1inventors
InventorsHiroshi TANABE, Tomoyuki Akashi, Yoshimi Watabe
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Abstract
In a semiconductor thin film forming system for modifying a predetermined region of a semiconductor thin film by exposing the semiconductor thin film to a projected light patterned through a pattern formed on a photo mask, the system includes a mechanism (opt20′) for uniformizing the light for exposure in a predetermined area on the photo mask. This system can provide a crystallized silicon film having a trap state density less than 1012 cm−2 and can provide a silicon-insulating film interface exhibiting a low interface state density.
Claims10
1-4. (canceled)
A semiconductor thin film forming system for modifying a predetermined region of a semiconductor thin film by exposing the semiconductor thin film to a projected exposure beam patterned through a pattern formed on a photo mask,
- said system comprising an alignment mechanism for aligning the patterned exposure beam with reference to a mark formed on a substrate, on which said semiconductor thin film is deposited.
6-16. (canceled)
Dependencies are inferred from the claim text.