Passivation planarization

A method of forming a pixel cell of an imaging device, said method comprising:

• forming a first passivation layer over a top horizontal metal layer comprising a portion of a plurality of metal lines, such that said first passivation layer has a non-planar upper surface;
• forming a spin-on-glass layer over said non-planar upper surface of said first passivation layer;
• planarizing a top surface of said spin-on-glass layer to form a planarized surface;
• and
• forming a second layer over said planarized surface.

A method of forming a pixel cell of an imaging device, said method comprising:

• forming a first passivation layer over a top horizontal metal layer comprising metal lines, such that valley regions are created in said first passivation layer;
• forming a spin-on-glass layer over said first passivation layer such that said valley regions are filled by said spin-on-glass layer;
• forming a second layer over said spin-on-glass layer;
• and
• planarizing a top surface of said second layer to form a planarized surface.

A method of forming a pixel cell of an imaging device, said method comprising:

• forming a passivation layer over metal lines having a bottom surface of a valley region above a top surface of said metal lines;
• forming a second layer over said passivation layer;
• and
• planarizing a surface of said second layer.