Method for manufacturing protein chip substrate using plasma and protein chip substrate manufactured by the method

A method for manufacturing a protein chip substrate, the method comprising the steps of:

• washing a slide glass with trichloroethylene, acetone and methanol, sequentially;
• arranging the slide glass on a substrate supporter inside a plasma reaction chamber;
• controlling an inner pressure of the plasma reaction chamber by a vacuum device;
• feeding cyclohexane as a precursor together with a carrier gas into the plasma reaction chamber by a bubbler;
• controlling an inner temperature of the plasma reaction chamber by a heater under the substrate supporter;
• applying inductively coupled plasma (ICP) power and slide voltage (SB) power to an outer electrode and the substrate supporter by the RF generator, respectively, to generate plasma between the slide glass and the plasma reaction chamber;
• uniformly depositing a plasma polymersized cyclohexane (PPCHex) film on the slide glass while polymerizing cyclohexane as a precursor by plasma;
• and
• depositing a plasma-polymerized ethylenediamine (PPEDA) film using ethylenediamine (EDA) as a precursor on the PPCHex film by inductively coupled plasma-chemical vapor deposition (ICP-CVD).