US 2007/0166656 A1 · Heating system of batch type reaction chamber and method thereof

Abstract

A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.

Claims16

Dependent claims

A heating system of a batch type reaction chamber comprising:

the reaction chamber of the batch type for forming a process space;
a heating apparatus having a plurality of heating groups formed along an outer circumference of the reaction chamber, the heating group having a plurality of heaters for forming divided heating areas at right angles and having a pair of heating units as a heating element connected to each supplying line having separate thermostats;
and
a reflecting device having a reflecting plate for reflecting the radiant heat of the heating apparatus toward an inside of the reaction chamber arranged around the heating apparatus and a cooling waterway for exchanging a heat and preventing a heat damage owing to a heating of the heating apparatus.

1 more element

Dependencies are inferred from the claim text.

Heating system of batch type reaction chamber and method thereof

Life of this patent

Heating system of batch type reaction chamber and method thereof

Life of this patent

Abstract

Claims16