Positive resist composition and process for formation of resist patterns
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHiroaki Shimizu, Takeshi Iwai
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Abstract
A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an (α-lower alkyl)acrylate ester that contains a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an (α-lower alkyl)acrylate ester that contains a lactone ring, a structural unit (a3) derived from an (α-lower alkyl)acrylate ester that contains a polar group-containing polycyclic group, and a structural unit (a4).
Claims10
A positive resist composition comprising:
- a resin component (A) that exhibits increased alkali solubility under action of acid, and
- an acid generator component (B) that generates acid on irradiation, wherein
- said component (A) is a copolymer comprising a structural unit (a1) derived from an (α-lower alkyl)acrylate ester that contains a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an (α-lower alkyl)acrylate ester that contains a lactone ring, a structural unit (a3) derived from an (α-lower alkyl)acrylate ester that contains a polar group-containing polycyclic group, and a structural unit (a4) represented by a general formula (1) shown below:
- (wherein, R11 represents a lower alkyl group or a hydrogen atom, and R12 represents an alkali-soluble group).
Dependencies are inferred from the claim text.