Positive photosensitive insulating resin composition and cured product thereof
AssigneeJsr Corporation
InventorsKatsumi Inomata, Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga
Life of this patent
Estimating the term…
Abstract
Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
Claims13
1-2. (canceled)
A positive photosensitive insulating resin composition comprising:
- (A) an alkali soluble resin having a phenolic hydroxyl group,
- (B) a compound having a quinonediazido group,
- (C) crosslinked fine particles,
- (D) a compound containing at least two alkyletherified amino groups in the molecule,
- (E) a thermal acid generator, and
- (F) a solvents
- wherein the thermal acid generator is at least one selected from the group consisting of benzylmethylphenylsulfonium hexafluoroantimonate, benzylmethylphenylsulfonium hexafluorophosphate, benzylmethylphenylsulfonium tetrafluoroborate, benzylmethylphenylsulfonium trifluoromethanesulfonate, benzyl (4-hydroxyphenyl)methylsulfonium hexafluoroantimonate, benzyl (4-hydroxyphenyl)methylsulfonium hexafluorophosphate, benzyl (4-hydroxyphenyl)methylsulfonium tetrafluoroborate, benzyl (4-hydroxyphenyl)methylsulfonium trifluoromethanesulfonate, benzenediazonium hexafluoroantimonate, benzenediazonium hexafluorophosphate, benzenediazonium tetrafluoroborate, benzenediazonium trifluoromethanesulfonate, naphthalenediazonium hexafluoroantimonate, and naphthalenediazonium trifluoromethanesulfonate.
Dependencies are inferred from the claim text.