Barrier wall of color filter, its manufacturing method, and color filter
AssigneeIcf Technology Limited.
InventorsYu-Ning Wang, Wei-Yuan Chen
Life of this patent
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AssigneeIcf Technology Limited.
InventorsYu-Ning Wang, Wei-Yuan Chen
Estimating the term…
A barrier wall (330) of a color filter includes a polysiloxane or its derivative. The polysiloxane or its derivative contains at least one siloxane unit. A manufacturing method for the barrier wall includes the steps of: providing a transparent substrate (310); forming a photoresist layer (300) on the substrate, the photoresist layer including a polysiloxane or its derivative, the polysiloxane or its derivative containing at least one siloxane unit; arranging a photomask (360) between the photoresist layer and a light source (370) and exposing the photoresist layer; and developing the photoresist layer and forming the barrier wall. A color filter includes a substrate and a plurality of sub-pixels each defined by a barrier wall. The barrier wall includes a polysiloxane or its derivative. The polysiloxane or its derivative contains at least one siloxane unit. Each sub-pixel carries a color ink (e.g., R, G, or B) therein.
A barrier wall of a color filter, comprising a polysiloxane or its derivative, the polysiloxane or its derivative containing at least one repeating unit represented by the following formula
A manufacturing method for a barrier wall of a color filter, comprising the steps of.
A manufacturing method for a barrier wall of a color filter, comprising the steps of:
A color filter, comprising a substrate and a plurality of sub-pixels each defined by a barrier wall, the barrier wall comprising a polysiloxane or its derivative, the polysiloxane or its derivative containing at least one repeating unit represented by the following formula
Dependencies are inferred from the claim text.