Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components
AssigneeLam Research Corporation
InventorChris Chang
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Abstract
Yttria-coated ceramic components of semiconductor material processing apparatuses include a substrate and at least one yttria-containing coating on the substrate. The components are made by applying a first yttria-containing coating on a ceramic substrate, which can be a green body of the ceramic material. The coated green body is sintered. The first yttria-containing coating can be treated to remove attached yttria particles resulting from the sintering. In another embodiment, a second yttria-containing coating can be thermally sprayed on the first yttria-containing coating to cover the particles.
Claims30
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A method of making a yttria-coated ceramic component of a semiconductor material processing apparatus, comprising thermal spraying a first yttria-containing coating on at least one surface of a substrate, the substrate comprising a green body of a ceramic material.
A method of making a yttria-coated ceramic component of a semiconductor material processing chamber, comprising:
- partially sintering a substrate comprising a ceramic material;
- thermal spraying a first yttria-containing coating on at least one surface of the substrate;
- co-sintering the substrate and the as-thermal sprayed first yttria-containing coating to form a bond layer comprising a multi-phase oxide of the ceramic material and yttria at an interface between the substrate and the first yttria-containing coating;
- and
- (i) treating an exposed surface of the first yttria-containing coating by a plasma conditioning treatment to reduce particles of yttria attached to the exposed surface after the co-sintering, or (ii) thermal spraying a second yttria-containing coating on the sintered first yttria-containing coating to cover the particles of yttria attached to the exposed surface after the co-sintering.
Dependencies are inferred from the claim text.