Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases

A method of abating hazardous chemicals in an effluent gas stream comprising:

• introducing the effluent gas stream into a thermal reaction chamber having an interior wall;
• and
• exposing the interior wall of the thermal reaction chamber to a secondary fluid flow;
• wherein the secondary fluid flow reduces deposition of particulates within the effluent gas stream on the interior wall of the thermal reaction chamber.

A method of treating an effluent gas stream from one or more semiconductor manufacturing process tools, comprising the steps of:

• introducing the effluent gas stream into an oxidizer unit including an oxidation chamber having an interior wall;
• and
• promoting fluid flow proximate to the interior wall of the oxidation chamber;
• wherein the fluid flow prevents accumulation of particulates on the interior wall of the oxidation chamber derived from the effluent gas stream.

A system for abating hazardous chemicals in an effluent gas stream comprising:

• a pre-scrubber unit adapted to remove scrubbable components from the effluent gas stream;
• a thermal reaction chamber coupled downstream from the pre-scrubber unit including an inlet to receive the effluent gas stream and an interior wall;
• and
• a gas delivery mechanism adapted to expose the interior wall of the thermal reaction chamber to a secondary fluid flow;
• wherein the secondary fluid flow reduces deposition of particulates within the effluent gas stream on the interior wall of the thermal reaction chamber.

A system for abating hazardous chemicals in an effluent gas stream comprising:

• a thermal reaction chamber including an inlet to receive the effluent gas stream and an interior wall;
• a gas delivery mechanism adapted to expose the interior wall of the thermal reaction chamber to a secondary fluid flow;
• and
• a post-scrubber unit coupled downstream from the thermal reaction chamber adapted to remove scrubbable components from the effluent gas stream;
• wherein the secondary fluid flow reduces deposition of particulates within the effluent gas stream on the interior wall of the thermal reaction chamber.