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US 2007/0166031 A1Published application
Substrate processing apparatus
AssigneeSokudo Co., Ltd.
InventorTetsuya Hamada
Life of this patent
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Abstract
A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.
Claims11
A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:
- a processing section for subjecting a substrate to processing;
- and
- an interface that transfers and receives the substrate between said processing section and said exposure device,
- said interface including
- first and second transport units that transport the substrate,
- a cleaning processing unit that subjects the substrate to cleaning processing before exposure processing by said exposure device,
- a drying processing unit that subjects the substrate to drying processing after the exposure processing by said exposure device, and
- a platform on which the substrate is temporarily placed,
- said first transport unit transporting the substrate among said processing section, said cleaning processing unit, and said platform,
- said second transport unit transporting the substrate among said platform, said exposure device, and said drying processing unit.
7 more elements
Dependencies are inferred from the claim text.