A semiconductor laser device manufacturing method comprising:
- a step for forming a lower cladding layer on a wafer;
- a step for forming an active layer on the lower cladding layer;
- a step for forming a first upper cladding layer on the active layer;
- a groove forming step for forming a groove that reaches at least the lower cladding layer;
- a dielectric forming process for forming a dielectric on an inner surface of the groove;
- a step for forming an electrode layer, which is electrically connected to the first upper cladding layer, on a surface of the dielectric;
- and
- a step for dividing the wafer, on which the lower cladding layer, the active layer, the first upper cladding layer, the dielectric and the electrode layer are formed, along a bottom surface of the groove.