Semiconductor manufacturing apparatus, semiconductor surface inspection apparatus, and surface inspection method
OwnerAkio Ishikawainventor
Life of this patent
Estimating the term…
Abstract
Semiconductor manufacturing apparatus 1 that manufactures semiconductor devices by applying a prescribed processing on a sample 2 in a semiconductor manufacturing process includes: an image capturing unit 24 that captures the image of a surface of the sample 2 before and after the prescribed processing; a defect detection unit 28 that detects defects in the images of the sample 2 captured before and after the prescribed processing; and a defect increase/decrease detection unit 32 that detects the increase and decrease of defects which are found after the prescribed processing compared to before the prescribed processing.
Claims24
Semiconductor manufacturing apparatus that manufactures semiconductor devices by applying prescribed processing to a sample in a semiconductor manufacturing process, comprising:
- an image capturing unit which captures the image of a surface of said sample before and after said prescribed processing;
- a defect detection unit which detects defects in images of said sample captured before and after said prescribed processing;
- and
- a defect increase/decrease detection unit which detects the increase and decrease of defects which are found after said prescribed processing compared to before said prescribed processing.
A semiconductor surface inspection apparatus which is provided to semiconductor manufacturing apparatus which manufactures semiconductor devices by applying prescribed processing on a sample in a semiconductor manufacturing process, and which detects a defect existing on a sample based on an image captured of the surface of said sample, comprising:
- an image capturing unit which captures the image of a surface of said sample before and after said prescribed processing;
- a defect detection unit which detects defects in images of said sample captured before and after said prescribed processing;
- and
- a defect increase/decrease detection unit which detects the increase and decrease of defects which are found after said prescribed processing compared to before said prescribed processing.
A surface inspection method for detecting a defect existing on a sample based on an image captured of the surface of said sample to which a prescribed processing is applied in a semiconductor manufacturing process, comprising:
- capturing the image of a surface of said sample before and after said prescribed processing;
- detecting defects in images of said sample captured before and after said prescribed processing;
- and
- detecting the increase and decrease of defects which are found after said prescribed processing compared to before said prescribed processing.
Dependencies are inferred from the claim text.